Plassys MEB 550S

The MEB 550S electron beam evaporator with fully automated control. For reduced pumping time the machine has a load lock and is capable of processing substrates up to 4". The substrate holder can be adjusted in an angel to the source with an accuracy of 0.01°. It also can rotate around it's own axis. For cleaning/etching substrates the evaporator has an ion gun with which an O2 or Ar/O2 plasma can be created. The accuracy of the deposition rate is determined by an oscillating crystal and is up to 0.01nm/s.

Available Metals: Al, Au, Pd, Pt, Ti, Cr, Co, V, Nb

 

 

User Support and  Scientific Advice

Responsible: Lubuna Shafeek   lubuna.shafeek@remove-this.ist.ac.at

SubstituteJuan Luis Aguilera juan.aguilera@ist.ac.at

 

 

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