Inspection and characterization

Optical microscopes

NIKON Microscope L 200 N

NIKON Microscope L 200 N  Offers 200 mm wafer and mask inspection capabilities for both transmitted and reflected light illumination. The microscope includes Episcopic Illumination, objectives 2,5 for bright field and 5x, 10x, 20x,  50x, 100x for bright- and dark field, trinocular tilting tube and motorized nosepiece,  light intensity control, and aperture diaphragm control.

  • 6-position mechanical objective with optical magnifications (5x, 10x, 20x, 50x and 100x)
  • 6-inch chuck
  • CMOS camera
  • Built-in Episcopic Illumination: 12V/100W halogen lamp light source
  • Built-in power sources for motorized control
  • Motorized control for nosepiece: CFI eyepiece lens series
  • Light intensity control
  • Aperture diaphragm control

User Support and  Scientific Advice:

Responsible: Lubuna Shafeek  lubuna.shafeek@ist.ac.at

 


Profilometer

AlphaStep D-600 Stylus Profiler 

The Alpha-Step D-600 Stylus Profiler is a high resolution 2D & 3D profiling, 2D stress, profile stitching – in an easy-to-use platform. This system includes a 200 mm motorized stage, with 150 mm x 178 mm X-Y range of motion and an optical lever sensor technology. The system also includes advanced optics and enhanced video controls for sample visualization.

  • Manual X/Y stage 4-inch travel and 360 degree rotation
  • Vacuum chuck, 1 to 15mg force
  • Highest vertical range at 1200 μm
  • Low force measurements at 0.03 to 15 mg
  • Step height repeatability of 5 Å on a 1 μm step
  • High resolution 5 MP color camera with 4x digital zoom
  • Software features: Keystone correction, arc correction, sequencing, and automated stitching
  • Intuitive user interface 

User Support and  Scientific Advice:

Responsible: Lubuna Shafeek  lubuna.shafeek@ist.ac.at

Substitute:   Juan Aguilera juan.aguilera@ist.ac.at 


DC probe station

150 COAX probe station is a dedicated 150 mm manual probe system for electrical testing on wafers or chips, with a maximum of 4 independent terminals. The chuck is compatible with wafer sizes up to 150 mm. A microscope with 15x – 100x magnification and LED illumination camera is used to center the probe needles on the contact pads. Three axis movement of the probe needles with the manual manipulators allows electrical and SOFT mechanical contact.  This probe station is coupled to Keithley 2450 Graphical Source Meter (SMU). Wide variety of applications are possible, such as I-V/C-V, RF, mm-Wave and sub-THz measurements, device characterization, failure analysis (FA), submicron probing, MEMS, and optoelectronic engineering tests.

User Support and  Scientific Advice:

Responsible: Juan Luis Aguilera juan.aguilera@ist.ac.at

Substitute:  Lubuna Shafeek  lubuna.shafeek@ist.ac.at


Elipsometer

FS-1 Multi-Wavelength Ellipsometer

The FS-1 Multi Wavelength Ellipsometer acquires ellipsometric data across 4 discrete bands in the visible spectrum, with the bands centered at 465 nm (blue), 525 nm (green), 580 nm (yellow), and 635 nm (red). It enable unique determination of film thickness for transparent films and determine additional sample parameters such as surface roughness, multiple film thicknesses, and index dispersion. 

User Support and  Scientific Advice:

Responsible: Juan Luis Aguilera  juan.aguilera@ist.ac.at

Substitute:  Lubuna Shafeek  lubuna.shafeek@ist.ac.at   



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